年产1000吨三氟化氮项⽬（特⽓⾏业纯度99.996%)

三氟化氮 (Nitrogen Trifluoride），化学式NF3，是⼀种强氧化剂。作为
在微电⼦⼯业中，三氟化氮是⼀种优良的等离⼦蚀刻⽓体，在半导体芯⽚、平板显⽰器、光纤、光伏电池等制造领域，三氟化氮主要⽤作等离⼦蚀刻⽓体和反应腔清洗剂。它还可以⽤于⾼能化学激光器，通过与氢反应在瞬间放出⼤量热來实现其应⽤。三氟化氮还可⽤作⾼能燃料，并且在⽕箭发射中作為氧化剂和推进剂使⽤。

I-nitrogen trifluoride, ifomula yamakhemikhali i-NF3, iyi-oxidizing eqinile. Njengegesi ekhethekile yezimboni ebalulekile, inezinhlobonhlobo zezicelo.
Embonini ye-microelectronics, i-nitrogen trifluoride iyigesi enhle kakhulu yokuhlanganisa i-plasma; Ku-chip ye-semiconductor, isibonisi sephaneli eyisicaba, i-optical fiber, amaseli e-photovoltaic nezinye izinkambu zokukhiqiza, i-nitrogen trifluoride isetshenziswa kakhulu njengegesi ye-plasma etching kanye ne-reaction cavity cleaning agent.
Ingasetshenziswa futhi kumalaser amakhemikhali anamandla amakhulu ukufeza ukusetshenziswa kwayo ngokusabela nge-hydrogen ukuze ikhiphe inani elikhulu lokushisa ngokuphazima kweso. I-nitrogen trifluoride iphinde isetshenziswe njengophethiloli onamandla amakhulu nanjenge-oxidizer kanye ne-propellant ekuqalisweni kwamarokhethi.